Do you think optical lithography will keep up, or will we need to rely more on EUV in the future?

You raise a good point. I personally feel that while optical lithography has made strides, EUV might be the game-changer for achieving sub-32nm nodes. However, as you've mentioned, it might not be mature enough yet. Double-patterning lithography (DPL) seems like a reliable stopgap until EUV becomes more mainstream.