How does ion Bombardment affect the Adhesion Process?

We have noticed that when you use ion bombardment, it can change the way crystals form in the film. This can lead to better adhesion and overall film quality. It's not just about cleaning the surface but also about changing how the film grows.

In my experience, ion bombardment is important for achieving high-quality films. I think it’s because it allows you to control the film properties better. We found that films without ion bombardment often have poor adhesion and higher stress, leading to failures.

I believe that the improvement in adhesion from ion bombardment is due to both cleaning the surface and changing nucleation. You get a double benefit. On one hand, it removes impurities, and on the other, it helps in the formation of a more structured film.

You can see a big difference in film stress when using ion bombardment. We observed that the stress can be managed better, which improves adhesion. When you control stress, you prevent the film from peeling off the substrate.